International Nuclear Information System (INIS)Īlumina substrate can be found in electronic components used in portable electronic devices. Retrospective dosimetry with alumina substrate from electronic components It was demonstrated that the composition and structure of an iron film can be affected by the surface morphology of the porous alumina substrate on which the film is grown. In addition, only a very small amount of γ-Fe was obtained. For porous alumina substrates with pore sizes larger than 200 nm, the deposited iron films contained many defects and the resulting α-Fe had smaller hyperfine magnetic fields. Iron atoms penetrated into pores with diameters of less than 160 nm, and were stabilized by forming γ-Fe, whereas α-Fe was produced as a flat plane covering the pores. The pore sizes (120 – 250 nm) of the substrates were controlled by changing the temperature during the anodic oxidation of aluminum plates. Iron films were deposited on porous alumina substrates using an arc plasma gun. Yamada, Yasuhiro, E-mail: Tanabe, Kenichi Nishida, Naoki [Tokyo University of Science (Japan) Kobayashi, Yoshio [The University of Electro-Communications (Japan) Iron films deposited on porous alumina substratesĮnergy Technology Data Exchange (ETDEWEB)
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